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Orienter Kit

PROPIERATARY ORIENTING SOLUTION BY ONE SEMICONDUCTOR FOR ENDURA AND CENTURA PLATFORMS

The laser-based wafer orientation system is designed to accurately determine the orientation of semiconductor wafers during manufacturing processes, which is crucial for ensuring precise alignment within process chambers.

Components

▪ High accuracy and repeatability

▪ Fast measurement speed

▪ Non-contact and non-destructive measurement method

▪ Suitable for use in clean room and high vacuum environments

▪ Chamber viewport imperfections are compensated for via calibration during installation

▪ Easy to use and integrate into existing manufacturing processes

▪ Customer configurable via touch GUI settings screen

▪ Dust covers to ensure repeatable accurate orientations

▪ Wafer size: 150mm and 200mm in diameter

▪ Supports different substrates: silicon, quartz, glass, sapphire, and silicon carbide

▪ Supports different wafer shapes: SNNF, JMF, and SMF

▪ Plug and play compatible with OEM stepper motor and connectors

▪ Easy troubleshooting and debugging via GUI

High precision lasermicrometer with mounting brackets, dust covers, and cables.

Drop In replacement utilizing previous mounting holes

A microcontroller-based PCB that controls the stepper motor, reads the laser-micrometer, calculates the wafer orientation and position, communicates with the system controller, and provides a graphical user interface via an LCD.

Operating Principals

The wafer is rotated on the pedestal via belt driven stepper motor.

▪ A high precision laser-micrometer is positioned at the edge of the wafer to read the wafer’s edge position at

▪ each step during the rotation. These edge measurements provide a wafer “profile”.

▪ The wafer registrations (notch or flat/flats) are determined by calculating the “extrapolation error” for each step, which is the deviation from the expected value based on the previous two steps of the profile.

▪ The center of the major registration can be marked and poisoned as specified by the system controller.

▪ Once the registration(s) is marked, the remaining profile data is fi`ed to an ideal sine wave.

▪ The sine wave parameters are used to calculate (Delta r), (Delta Theta), and (R Offset), which are then transmitted back to the system controller via a serial connection.

Specifications

▪ Rotation measurement accuracy: ±0.05 degrees

▪ Position measurement accuracy: ±0.02mm

▪ Measurement speed: < 15 seconds per wafer

▪ Laser power: 62uW

▪ Laser wavelength: Multiple wavelengths (visible red)

▪ Operating temperature: 10°C to 32°C

▪ Humidity: < 40% non-condensing

▪ Power supply: 24VDC

▪ Communication interface: RS232

Applications

Silicon Carbide Products

MEMES Device Fabrication

Optical Device Manufacturing

Features and Benefits

Semiconductor Wafer Manufacturing

150 MM.
200MM.
orienter kit
ONE-OCP-150
orienter kit for centura and endura

Wafer Size

Order

ONE-OCP-200
orienter

Receivables

Fast Delivery

Easy Refund

24/7 Support

FOR QUOTATION OR QUESTIONS, PLEASE EMAIL SALES@ONESEMICONDUCTOR.COM OR YOUR ONE SEMICONDUCTOR SALES REPRESENTATIVE

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